Cleaning machine that does not use chemicals or detergents for semiconductors.
Contributing to particle removal in semiconductor manufacturing!
In the semiconductor industry, the removal of fine particles that affect product quality is crucial. Particularly, as density increases, contamination becomes a significant factor influencing yield. Traditional cleaning methods have issues related to environmental impact from the use of chemicals and detergents, as well as problems with residues after cleaning. Our cleaning machines use super alkaline ionized water to address these challenges. 【Usage Scenarios】 - Cleaning of semiconductor wafers - Removal of fine particles from various components - Removal of foreign substances in the manufacturing process 【Benefits of Implementation】 - Reduction in the use of chemicals and detergents - Decrease in environmental impact - Improved yield due to high cleaning power
- Company:Eプラン
- Price:1 million yen-5 million yen